Non-ohmic properties of CaCu3Ti4O12 thin films deposited By RF-sputtering

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS

Non-ohmic properties of CaCu3Ti4O12 thin films deposited By RF-sputtering

Abstract:  Calcium copper titanate (CaCu3Ti4O12, CCTO), thin films with polycrystalline nature have been deposited by RF sputtering on Pt/Ti/SiO2/Si (100) substrates at a room temperature followed by annealing at 600 degrees C for 2 h in a conventional furnace. The CCTO thin film present a cubic structure with lattice parameter a = 7.379 +/- 0.001 angstrom free of secondary phases. Dielectric spectroscopy was employed to examine the polycrystalline behaviour of CCTO material and the mechanisms responsible for the barrier-layer capacitances associated with Schottky-type barriers and the non-Ohmic properties. The film presents an electric breakdown field (E-b = 203 V cm(-1)) and then nonlinear coefficient (alpha = 6), which is even lower than that of the ZnO and SnO2 based varistors The observed electrical features of CCTO thin films are highly dependent on the [CaO12], [CaO4], [CuO11], [CuO11Vox] and [TiO5 center dot V-O(center dot)] clusters.

Author(s): Foschini, CR (Foschini, C. R.); Hangai, B (Hangai, B.); Cavalcante, CS (Cavalcante, C. S.); Simoes, AZ (Simoes, A. Z.); Cilense, M (Cilense, M.); Longo, E (Longo, E.)

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS

Volume: 28 | Ed: 20 | Pages: 15685-15693 | Published: OCT 2017

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DOI: 10.1007/s10854-017-7458-5

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O CDMF é um dos Centros de Pesquisa, Inovação e Difusão (CEPID) apoiados pela FAPESP. O Centro também recebe investimento do CNPq, a partir do Instituto Nacional de Ciência e Tecnologia dos Materiais em Nanotecnologia (INCTMN).