Photoelectrochemical degradation of bisphenol A using Cu doped WO3 electrodes
Abstract: Cu-doped WO3 electrode was fabricated on FTO substrate via one step preparation by modified sol-gel method using a suspension of [(NH4)(10)H-2(W2O7)(6)] and CuSO4 center dot 5H(2)O in mix of polyethylene glycol 300 and ethylene glycol. Photoelectrocatalytic degradation of bisphenol A (BPA) with Cu-doped WO3 electrode was performed under visible light irradiation and H2O2 as auxiliary oxidizing agent. For monitoring of the photoelectrocatalysis it was used conventional and alternative method (UV-Vis spectrophotometry and electrochemical sensor, respectively). After 8 h of assay, it was verified removal of 80% of BPA and formation of the phenolic intermediates using electrochemical sensor and 75% of total carbon organic removal.
Author(s): Goulart, LA ; Alves, SA; Mascaro, LH
JOURNAL OF ELECTROANALYTICAL CHEMISTRY
Volume: 839 Pages: 123-133 Published: APR 15 2019
PDF: Photoelectrochemical degradation of bisphenol A using Cu doped WO3 electrodes
DOI: 10.1016/j.jelechem.2019.03.027
