CaCu3Ti4O12 thin films with non-linear resistivity deposited by RF-sputtering

Journal of Alloys and Compounds Volume: 574 Pages: 604-608 Published: 2013

Cross sectional SEM image and Atomic Force Microscopy for CCTO thin film deposited at room temperature and annealed at 600 °C for 2h in a conventional furnace.

Writers: C.R. Foschini, R. Tararam, A.Z. Simões, M. Cilense, E. Longo, J.A. Varela

Keywords: Thin films; Chemical synthesis; X-ray diffraction; Electron microscopy

Abstract: Calcium copper titanate, CaCu3Ti4O12, CCTO, thin films with polycrystalline nature have been deposited by RF sputtering on Pt/Ti/SiO2/Si (10 0) substrates at a room temperature followed by annealing at 600 C for 2 h in a conventional furnace. The CCTO thin film present a cubic structure with lattice parameter a = 7.379 ± 0.001 Å free of secondary phases. The observed electrical features of CCTO thin films are highly dependent on the [CaO12], [CaO4], [CuO11], [CuO11Vx o] and [TiO5 V O] clusters. The CCTO film capacitor showed a dielectric loss of 0.40 and a dielectric permittivity of 70 at 1 kHz. The J–V behavior is completely symmetrical, regardless of whether the conduction is limited by interfacial barriers or by bulk-like mechanisms.

See PDF: CaCu3Ti4O12 thin films with non-linear resistivity deposited by RF-sputtering

DOI: 10.1016/j.jallcom.2013.05.216

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